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       Small to Very Large Scale Micro-Nano-Optics R&D Services

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Micro-Nano-Optics Fabrication based on LIGA Technology SVG Optronics specializes micro-nano structures based LIGA technology and fabricates the mold  and mask by its own research equipment with relevant patents. The mask dimension can reach to 40-inch and the feature sizes of micro structure can range from 100nm to 200um.

       Our ability

To build high resolution maskless laser lithography and digital interference lithography systems is the result of a long period of experience collected in this area.  After about 5 years in an academic environment, followed by 8 years in an industrial environment, we have learned to master the various tools to build such highly complex systems. SVG Optronics employs dedicated people with knowledge in the area of micro-optics, precision mechanics, laser technology, high speed digital and analog electronics, software in various levels, image processing and recognition, and many more.  After more than 8 years of using our systems, we have application and processing experience in many different fields. Therefore, if a customer purchases a lithography tool, he or she does not only obtain a high performance pattern generator but also a wealth of knowledge to apply the system.

       Large-format Mastering

large format mastering is the process by which we create the more than wafer-scale original of our desired fully populated with the desired optical elements. We have 2 key technologies developed for large-scale mastering.

       Digital Interference lithography

One important feature is that the Interference Patterning Lithography offers large exposure areas and high spatial-phase coherence compared to other methods-an interference pattern between one or more coherent light beams is recorded in an optical material. Ordinarily, however, the spatial resolution (smallest attainable period of the features) is limited by the wavelength (λ) of the light source used and the refractive index (n) of the recording material according to λ/2n. The researchers at SVG Optronics refined this basic method by using an alternative spatial-frequency-multiplication process that uses multiple-beam exposures through phase grating patterns, binary optical components on quartz substrates in the optical head aligned with high accuracy, overcoming the wavelength-limited resolution problem.

Gray scale lithography 

    Gray Scale Process

The final result of this entire process depends on the electronic data, the laser writing and the development, and all of these steps can be independently tuned to produce the best result. This makes it very efficient and economical for product development, as there are no expensive gray tone masks needed in the process.

The gray scale lithography is used for a variety of applications, one of the major ones being micro-optical components like microlenses, diffractive elements or hybrids. The optical structures in the photoresist can subsequently be transferred into the substrate by reactive ion etching or a master for mass production can be created using electroplating.

       Laser Writing and LIGA

Proprietary leading edge mastering technology. Smooth continuous structures enabling higher diffraction efficiencies than possible with available binary optics . Up to 40 inch substrate size . Surface roughness better than 20 nm rms . High writing speed . Submicron spot-size . Maximum profile depth: 50 um.

               

       Recombination

This is our proprietary technology for creating a wafer-scale master from an individual master fabricated by a technology partner. Masters we use in recombination include diamond-turning, e-beam and reflow. Recombination has been developed by SVG to allow us to step-and repeat an individual master across an entire 40" wafer to produce wafer-scale masters and tools with micron accuracy in x,y and z positioning and no change in surface form error. 

      UV Replication

UV-replication is the technology best suited for high-volume fabrication of micro-optical elements at low piece cost.  Exclusive SVG breakthroughs in this technology have improved the durability of the UV-replicated elements to a level where they can easily withstand reflow temperatures.

UV-embossing involves spreading a thin layer of liquid-phase epoxy material onto float glass or film.  Next, a special mold is pressed against the epoxy layer so that the epoxy fills the microstructures. Then the epoxy is hardened through UV exposure, allowing the resulting structure to be separated from the mold. SVG's patented UV replication process offers excellent layer uniformity over areas of 18" and more, ensuring the precision and durability of each element.

Further degrees of freedom in the design of micro-optical elements can be achieved by embossing on both sides of the films. SVG's UV-embossing process can replicated such "double-sided elements" with a front-to-back alignment accuracy of ±10 micrometers between the two sides. Alignment and assembly costs can be further reduced by applying UV-embossing of microlenses directly onto image sensors, semiconductor light sources such as  LED arrays, or detectors.

      Micro-Optics Fundamentals

Lenses, mirrors and prisms are the basic building blocks of any optical system. While current industry applications continue to demand higher functionality and lower manufacturing costs, traditional optics are limited by production constraints to relatively large-sized and costly elements. The keys to meeting industry needs are miniaturization and integration of the optical systems, and micro-optics is the technology that makes this possible.

       Refractive Micro-Optics

 

The elements in refractive micro-optics are analogous to conventional optical elements, only much smaller. With such small sizes come new design challenges. For instance, diffraction effects that don't show up in conventional optics now need to be considered. But the benefits are even more significant: microlenses and microlens arrays take up less space, add less weight and cost less.

      Diffractive Optics

Diffractive optical elements are optical components whose function cannot be explained by the simple law of reflection, known as Snell's law. These elements are macroscopically planar microstructures fabricated on flat substrates, and designing them requires the application of advanced numerical algorithms based on diffraction theory. Here, too, the benefits are substantial: diffractive elements can perform specialized functions unknown to conventional optics, e.g. pattern generation, complex beam shaping, etc.

 

 

 

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